Surface Microscopy with Low Energy Electrons

Gebonden Engels 2014 2014e druk 9781493909346
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This book, written by a pioneer in surface physics and thin film research and the inventor of Low Energy Electron Microscopy (LEEM), Spin-Polarized Low Energy Electron Microscopy (SPLEEM) and Spectroscopic Photo Emission and Low Energy Electron Microscopy (SPELEEM), covers these and other techniques for the imaging of surfaces with low energy (slow) electrons. These techniques also include Photoemission Electron Microscopy (PEEM), X-ray Photoemission Electron Microscopy (XPEEM), and their combination with microdiffraction and microspectroscopy, all of which use cathode lenses and slow electrons. Of particular interest are the fundamentals and applications of LEEM, PEEM, and XPEEM because of their widespread use. Numerous illustrations illuminate the fundamental aspects of the electron optics, the experimental setup, and particularly the application results with these instruments. Surface Microscopy with Low Energy Electrons will give the reader a unified picture of the imaging, diffraction, and spectroscopy methods that are possible using low energy electron microscopes.

Specificaties

ISBN13:9781493909346
Taal:Engels
Bindwijze:gebonden
Aantal pagina's:496
Uitgever:Springer New York
Druk:2014

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Inhoudsopgave

<p>Chapter 1. Introduction<br>Abstract<br>1.1. The early years <br>1.2. The postwar revival <br>References </p><p>Chapter 2. Basic Interactions<br>Abstract<br>2.1 Fundamental theories of electron emission<br>2.2  Photoemission<br>2.2.1  General considerations<br>2.2.2  The free electron gas approximation<br>2.2.3  Band structure UV photoemission<br>2.2.4  Spin effects in UV photoemission<br>2.2.5  Surface plasmon photoemission<br>2.2.6  X-ray photoemission<br>2.2.6.1  Photoelectron emission<br>2.2.6.2  Secondary electron emission<br>2.3  Electron reflection<br>2.3.1  General considerations<br>2.3.2  Elastic scattering<br>2.3.3  Inelastic scattering<br>2.3.4  Surface effects<br>2.3.5  VLEED, LEETS, TCS<br>2.3.6  Quantum well effects<br>2.3.7  Other aspects<br>References</p><p>Chapter 3. Instrumentation<br>Abstract<br>3.1  Instruments: from simple to complex3.1.1  PEEM<br>3.1.2  LEEM<br>3.1.3  Aberration-corrected instruments<br>3.1.4  Spectroscopic imaging instruments<br>3.1.5  Spin-resolved imaging instruments<br>3.2  Components<br>3.2.1  Objective lens and other axial-symmetric lenses<br>3.2.2  Magnetic deflectors<br>3.2.3  Electron mirrors<br>3.2.4  Aberration correctors<br>3.2.5  Energy filters<br>3.2.6  Wien filters<br>3.2.7  Photon sources<br>3.2.8  Electron sources<br>3.2.9  Other components (image detectors vacuum system including airlock and specimen preparation chamber, electronics)<br>References</p><p>Chapter 4. Theory of image formation<br>Abstract<br>4.1 Introduct</p>ion<br>4.2  Wave propagation: The contrast transfer function<br>4.2.1  Low energy electron microscopy. The wave amplitude|<br>4.2.2  The image intensity<br>4.2.3  Mirror electron microscopy<br>4.2.4  Emission electron microscopy<br>4.3  Through-focus series image improvement<br>4.4  Information transfer in the image acquisition system<br>4.5  Summary and outlook<br>References<p></p><p>Chapter 5. Applications in surface science<br>Abstract<br>5.1  Surface microstructure<br>5.1.1 Metals<br>5.1.2  Semiconductors<br>5.1.2.1  Si(111)<br>5.1.2.2  Si(100)<br>5.1.2.3  Other Si surfaces<br>5.1.3  Other inorganic semiconductor surfaces<br>5.1.4  Other inorganic compound surfaces<br>5.2  Adsorption<br>5.2.1  Adsorption on metals<br>5.2.1.1  Nonmetallic adsorbates<br>5.2.1.2  Coadsorption and reaction: catalysis<br>5.2.1.3  Metallic adsorbates<br>5.2.2  Adsorption on Semiconductors<br>5.2.2.1  Metallic adsorbates<br>5.2.2.2  Nonmetallic adsorbates<br>5.3  Film growth and structure<br>5.3.1  Films on semiconductors<br>5.3.1.1  Metal films<br>5.3.1.2  Ge on Si<br>5.3.1.3  Other films on semiconductors<br>5.3.1.4  Nanostructures and droplets on semiconductors5.3.2  Films on metals<br>5.3.2.1  Metal films<br>5.3.2.2  Inorganic compound films<br>5.3.3  Organic films<br>References</p><p>Chapter 6. Applications in other fields<br>Abstract<br>6.1 Graphene<br>6.1.1  Introduction<br>6.1.2  Graphene on SiC<br>6.1.2.1  Growth and microstructure<br>6.1.2.2  Intercalation<br>6.1.3  Graphene on metals</p>6.1.3.1  Introduction<br>6.1.3.2  Growth and microstructure<br>6.1.3.3  Intercalation<br>6.2  Plasmons<br>6.2.1  Introduction<br>6.2.2  Linear structures<br>6.2.3  Nanostructures<br>6.2.4  Complex wave fields<br>6.2.5  Limitations<br>6.3  Technological applications<br>6.3.1  General materials applications<br>6.3.2  Electronics<br>6.4  Biology<br>6.5  A multimethod case study<br>References<p></p><p>Chapter 7. Magnetic imaging<br>Abstract7.1  Introduction<br>7.2  Ferromagnetic films<br>7.2.1  Single layers<br>7.2.2  Quantum well effects<br>7.2.3  Bilayers<br>7.2.4  Trilayers<br>7.2.5  Multilayers<br>7.2.6  Compound layers<br>7.3  Bulk magnetic materials<br>7.3.1  Ferromagnetic materials<br>7.3.2  Antiferromagnetic materials<br>7.4 Ferromagnetic-antiferromagnetic interfaces<br>7.5 Nanostructures<br>7.5.1  Introduction<br>7.5.2  Static domain structure<br>7.5.3  Field and current influence<br>7.5.4  Nanodots and nanostructure arrays<br>7.6. Ferroelectrics / Multiferroics<br>7.6.1  Ferroelectries<br>7.6.2  Multiferroics</p><p>Chapter 8. Other surface imaging methods with electrons<br>Abstract<br>8.1 Scanning Low Energy Electron Microscopy<br>8.2  Scanning Low Energy Electron Diffraction Microscopy<br>8.3  Reflection Electron Microscopy<br>8.4  Secondary and Auger Electron Microscopy<br>8.5  Scanning Electron Microscopy with Spin Analysis<br>8.6  Scanning Photoelectron Emission Microscopy<br>8.7 Concluding remarks</p>

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